Título |
Functionalization of hydrogen-free diamond-like carbon films using open-air dielectric barrier discharge atmospheric plasma treatments |
Autores |
ENDRINO ARMENTEROS, JOSÉ LUIS, Marco J.F. , Allen M. , Poolcharuansin P. , Phani A.R. , Albella J.M. , Anders A. |
Publicación externa |
Si |
Medio |
Appl. Surf. Sci. |
Alcance |
Article |
Naturaleza |
Científica |
Cuartil JCR |
1 |
Cuartil SJR |
1 |
Impacto JCR |
1.576 |
Impacto SJR |
0.89 |
Web |
https://www.scopus.com/inward/record.uri?eid=2-s2.0-43849085955&doi=10.1016%2fj.apsusc.2008.02.065&partnerID=40&md5=9eb02bec7e2087c63cef5e2217c2e105 |
Fecha de publicacion |
01/01/2008 |
ISI |
000256099500005 |
Scopus Id |
2-s2.0-43849085955 |
DOI |
10.1016/j.apsusc.2008.02.065 |
Abstract |
A dielectric barrier discharge (DBD) technique has been employed to produce uniform atmospheric plasmas of He and N2 gas mixtures in open air in order to functionalize the surface of filtered-arc deposited hydrogen-free diamond-like carbon (DLC) films. XPS measurements were carried out on both untreated and He/N2 DBD plasma-treated DLC surfaces. Chemical states of the C 1s and N 1s peaks were collected and used to characterize the surface bonds. Contact angle measurements were also used to record the short- and long-term variations in wettability of treated and untreated DLC. In addition, cell viability tests were performed to determine the influence of various He/N2 atmospheric plasma treatments on the attachment of osteoblast MC3T3 cells. Current evidence shows the feasibility of atmospheric plasmas in producing long-lasting variations in the surface bonding and surface energy of hydrogen-free DLC and consequently the potential for this technique in the functionalization of DLC-coated devices. © 2008 Elsevier B.V. All rights reserved. |
Palabras clave |
Contact angle; Deposition; Dielectric materials; Interfacial energy; Ion implantation; Osteoblasts; Plasma applications; Wetting; X ray photoelectron spectroscopy; Cell viability; Dielectric barrier discharge; Surface bonds; Diamond like carbon films |
Miembros de la Universidad Loyola |
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