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Structure and properties of silver-containing a-C(H) films deposited by plasma immersion ion implantation

Autores

ENDRINO ARMENTEROS, JOSÉ LUIS, Escobar Galindo R. , Zhang H.-S. , Allen M. , Gago R. , Espinosa A. , Anders A.

Publicación externa

Si

Medio

Surf. Coat. Technol.

Alcance

Article

Naturaleza

Científica

Cuartil JCR

Cuartil SJR

Impacto JCR

1.86

Impacto SJR

1.463

Fecha de publicacion

01/01/2008

ISI

000255492700031

Scopus Id

2-s2.0-40949114177

Abstract

In this study, we have grown silver-containing hydrogenated (a-C:H) and non-hydrogenated (a-C) amorphous carbon coatings by two plasma immersion ion implantation methods: I) chemical vapor deposition of methane combined with pulsed filtered cathodic arc deposition of silver, and II) by alternating arc pulses from graphite and silver in a dual cathodic arc plasma source. This unique "bias selective" feature of the deposition system allowed the deposition of silver with the substrates at ground and avoided the sputtering of the grown a-C film. Chemical composition of the samples was analyzed by acquiring their compositional depth-profiles using radio-frequency Glow Discharge Optical Emission Spectroscopy (rf-GDOES), while the microstructural properties were analyzed by X-ray absorption near edge spectroscopy (XANES) and Raman spectroscopy. In this contribution, we compare mechanical and biomedical properties by means of nanoindentation and cell viability tests, respectively, of a-C(H) films obtained by two different plasma immersion ion implantation techniques. © 2008 Elsevier B.V. All rights reserved.

Palabras clave

Amorphous carbon; Ion implantation; Microstructure; Nanoindentation; Plasma enhanced chemical vapor deposition; Silver; Structure (composition); Cell viability; Plasma immersion ion implantation; Inorganic coatings; Amorphous carbon; Inorganic coatings; Ion implantation; Microstructure; Nanoindentation; Plasma enhanced chemical vapor deposition; Silver; Structure (composition)

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