Mosquera A. , Horwat D. , Vazquez L. , Gutiérrez A. , Erko A. , Anders A. , Andersson J. , ENDRINO ARMENTEROS, JOSÉ LUIS
Si
J. Mater. Res.
Article
Científica
1.713
0.92
01/01/2012
000304064500009
2-s2.0-84857864706
Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 °C of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples' chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 °C and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 °C, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO2 and PtO. Pt-L3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 °C. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM. Copyright © Materials Research Society 2011.
Amorphous-like; Annealing temperatures; Fractal characteristics; Fractal properties; Platinum oxide; Porous platinum; Scanning electron microscopy image; Sputtering techniques; Thermal evolution; X ray photoelectron spectroscopies (XPS); X-ray absorption near-edge structure; XANES; XPS spectra; XRD spectra; Annealing; Atomic force microscopy; Bonding; Decomposition; Electronic structure; Fractals; Oxide films; Platinum compounds; Scanning electron microscopy; Thin films; X ray absorption near edge structure spectroscopy; X ray diffraction; X ray photoelectron spectroscopy; Platinum