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Evolution of structural and physical properties upon annealing of sputter-deposited Zr0.84Y0.16-O2 films incorporating copper and palladium nanoparticles

Authors

Zakharov D.I. , Horwat D. , ENDRINO ARMENTEROS, JOSÉ LUIS, Capon F. , Pierson J.F.

External publication

Si

Means

IOP Conf. Ser. Mater. Sci. Eng.

Scope

Conference Paper

Nature

Científica

JCR Quartile

SJR Quartile

Publication date

01/01/2009

ISI

000285529200022

Scopus Id

2-s2.0-84893465022

Abstract

Me-incorporated Zr0.84Y0.16 oxide thin films (Me: Cu or Pd) were synthesized by magnetron co-sputtering. The film structural evolution due to metal content increase was shown: Me-doped nanocrystalline yttria stabilized zirconia (YSZ); Me-doped amorphous oxide; metal nanoparticles embedded in the amorphous oxide matrix. Annealing for 2 h at 300°C in air promoted copper oxide formation and the segregation of very fine Pd particles. XANES analysis at the Cu-K edge showed that Cu is bonded to oxygen and Zr(Y) in Cu-doped amorphous oxide; this state was not affected by the thermal treatment. XANES and resistivity analyses indicated that the Cu nanoparticles likely have oxidized surfaces while the Pd-containing films showed only minor chemical changes after annealing. © 2009 IOP Publishing Ltd.

Keywords

Amorphous oxides; Chemical change; Cu nanoparticles; Magnetron co-sputtering; Metal content; Metal nanoparticles; Nanocrystallines; Oxide thin films; Oxidized surfaces; Palladium nanoparticles; Pd particle; Structural and physical properties; Structural evolution; Thermal treatment; XANES; XANES analysis; Amorphous films; Annealing; Magnetrons; Materials science; Metal analysis; Nanoparticles; Oxide films; Oxygen; Palladium; X ray analysis; Yttria stabilized zirconia; Zirconia; Zirconium; Copper