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Interface-Induced Plasmon Nonhomogeneity in Nanostructured Metal-Dielectric Planar Metamaterial

Authors

Kovalev, A. I. , Wainstein, D. L. , Rashkovskiy, A. Yu. , Gago, R. , Soldera, F. , ENDRINO ARMENTEROS, JOSÉ LUIS, Fox-Rabinovich, G. S.

External publication

Si

Means

J. Nanomater.

Scope

Article

Nature

Científica

JCR Quartile

SJR Quartile

JCR Impact

1.758

SJR Impact

0.392

Publication date

01/01/2015

ISI

000352399000001

Scopus Id

2-s2.0-84926442678

Abstract

Transformations of the electronic structure in thin silver layers in metal-dielectric (TiAlN/Ag) multilayer nanocomposite were investigated by a set of electron spectroscopy techniques. Localization of the electronic states in the valence band and reduction of electron concentration in the conduction band was observed. This led to decreasing metallic properties of silver in the thin films. A critical layer thickness of 23.5 nm associated with the development of quantum effects was determined by X-ray photoelectron spectroscopy. Scanning Auger electron microscopy of characteristic energy losses provided images of plasmon localization in the Ag layers. The nonuniformity of plasmon intensities distribution near the metal-nitride interfaces was assessed experimentally.

Keywords

Auger electron spectroscopy; Electron spectroscopy; Electronic structure; Energy dissipation; Film preparation; Plasmons; Quantum electronics; Quantum theory; Scanning electron microscopy; Silver; Characteristic energy; Critical layer thickness; Electron concentration; Metal dielectrics; Metallic properties; Nanostructured metals; Quantum effects; Scanning auger electron microscopies; X ray photoelectron spectroscopy

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