ENDRINO ARMENTEROS, JOSÉ LUIS, Palacin S. , Gutierrez A. , Aguirre M. , Schäfers F.
Si
Mater Res Soc Symp Proc
Conference Paper
Científica
0.222
01/01/2006
2-s2.0-41549099707
In the present study, hard TiSiN coating compounds with different Si content have been deposited by the magnetron sputtering technique. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) have been employed to investigate the effects of Si addition on the composition, structure and phase development of the cubic NaCl-type structure. To get some insight on these changes, X-ray absorption spectra have been measured at the Ti and Si K-edges in fluorescence yield mode. The collected data showed that the interaction between Ti and Si was weak and the formation of a-Si3N4 can be assumed. Hardness measurements were also consistent with the formation of hard nanocomposite films. A maximum hardness of about 36 GPa was obtained for the sample with 11 at. % Si. © 2007 Materials Research Society.
Hardness testing; Magnetron sputtering; Nanocrystalline silicon; Phase interfaces; X ray absorption spectroscopy; X ray diffraction; Hardness measurements; Nanocomposite thin films; Phase development; Thin films