Título Influence of the nanoscale structural features on the properties and electronic structure of Al-doped ZnO thin films: An X-ray absorption study
Autores Jullien M. , Horwat D. , Manzeh F. , Escobar Galindo R. , Bauer P. , Pierson J.F. , ENDRINO ARMENTEROS, JOSÉ LUIS
Publicación externa Si
Medio SOLAR ENERGY MATERIALS AND SOLAR CELLS
Alcance Article
Naturaleza Científica
Cuartil JCR 1
Cuartil SJR 1
Impacto JCR 4.54200
Impacto SJR 2.18200
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-79958115638&doi=10.1016%2fj.solmat.2011.04.003&partnerID=40&md5=56b8d9ee8065705038c2c7d321d949a1
Fecha de publicacion 01/01/2011
ISI 292945700049
Scopus Id 2-s2.0-79958115638
DOI 10.1016/j.solmat.2011.04.003
Abstract Transparent Al-doped ZnO thin films were deposited by reactive magnetron sputtering with different oxygen flow rates. The electronic resistivity, measured by the 4 point-probe method, is very sensitive to the sample position relative to the magnetron axis: the closer the magnetron from the axis the higher the resistivity. This is more pronounced for the films deposited under higher oxygen flow rate. Neither Rutherford backscattering spectroscopy nor ZnK edge X-ray absorption near-edge structure (XANES) analyses evidenced any change in chemical composition such as a measurable variation of the oxygen stoichiometry. XANES at the AlK and OK edges show that (i) a portion of the aluminum atoms get positioned in octahedral conformation with oxygen, consistent with the formation of an Al2O3(ZnO)m nanolaminate structure, (ii) the films exhibit relaxed O-terminated (0 0 0 1) surfaces with a higher density of empty states in more resistive samples. These two findings are believed to play a significant role on the electrical measurements by dopant deactivation and by creating an insulating barrier at the film surface, respectively. © 2011 Elsevier B.V.
Palabras clave Al-doped ZnO; Aluminum atoms; Chemical compositions; Dopant deactivation; Electrical measurement; EmptyState; Film surfaces; Homologous phase; Insulating barriers; Nano scale; Nanolaminate structures;
Miembros de la Universidad Loyola

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