Título Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films
Autores Mosquera A. , Horwat D. , Vazquez L. , Gutiérrez A. , Erko A. , Anders A. , Andersson J. , ENDRINO ARMENTEROS, JOSÉ LUIS
Publicación externa Si
Medio JOURNAL OF MATERIALS RESEARCH
Alcance Article
Naturaleza Científica
Cuartil JCR 2
Cuartil SJR 1
Impacto JCR 1.71300
Impacto SJR 0.92000
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-84857864706&doi=10.1557%2fjmr.2011.418&partnerID=40&md5=6bbef433a64b6bc332af9ea2c2875693
Fecha de publicacion 01/01/2012
ISI 304064500009
Scopus Id 2-s2.0-84857864706
DOI 10.1557/jmr.2011.418
Abstract Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 °C of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples\' chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 °C and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 °C, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO2 and PtO. Pt-L3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 °C. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM. Copyright © Materials Research Society 2011.
Palabras clave Amorphous-like; Annealing temperatures; Fractal characteristics; Fractal properties; Platinum oxide; Porous platinum; Scanning electron microscopy image; Sputtering techniques; Thermal evolution; X ra
Miembros de la Universidad Loyola

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