Title Aluminum incorporation in Ti1-x AlxN films studied by x-ray absorption near-edge structure
Authors Gago R. , Redondo-Cubero A. , ENDRINO ARMENTEROS, JOSÉ LUIS, Ji?nez I. , Shevchenko N.
External publication Si
Means JOURNAL OF APPLIED PHYSICS
Scope Article
Nature Científica
JCR Quartile 1
SJR Quartile 1
SJR Impact 1.51
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-67649556971&doi=10.1063%2f1.3139296&partnerID=40&md5=4311888bb56e8d4cd70b3ddfa0bd9adb
Publication date 01/01/2009
ISI 000267053200054
Scopus Id 2-s2.0-67649556971
DOI 10.1063/1.3139296
Abstract The local bonding structure of titanium aluminum nitride (Ti1-x AlxN) films grown by dc magnetron cosputtering with different AlN molar fractions (x) has been studied by x-ray absorption near-edge structure (XANES) recorded in total electron yield mode. Grazing incidence x-ray diffraction (GIXRD) shows the formation of a ternary solid solution with cubic structure (c Ti1-x AlxN) that shrinks with the incorporation of Al and that, above a solubility limit of x~0.7, segregation of w-AlN and c-Ti1-x AlxN phases occurs. The Al incorporation in the cubic structure and lattice shrinkage can also be observed using XANES spectral features. However, contrary to GIXRD, direct evidence of w -AlN formation is not observed, suggesting a dominance and surface enrichment of cubic environments. For x>0.7, XANES shows the formation of Ti-Al bonds, which could be related to the segregation of w-AlN. This study shows the relevance of local-order information to assess the atomic structure of Ti 1-x AlxN solutions. © 2009 American Institute of Physics.
Keywords Al incorporation; AlN; Aluminum incorporation; Atomic structure; Cubic structure; DC magnetron co-sputtering; Grazing-incidence X-ray diffraction; Local bonding; Molar fractions; Solubility limits; Spectral feature; Surface enrichment; Titanium aluminum nitride; Total electron yield; X-ray absorption near-edge structure; XANES; Absorption; Alumina; Aluminum nitride; Nitrides; Segregation (metallography); Titanium; Titanium nitride; X ray absorption; X ray analysis; Aluminum
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