Title Creation of a control system for plasma delivery to increase determinism and robustness while processing using an ICP torch
Authors Zhou H. , Jourdain R. , Serantoni V. , ENDRINO ARMENTEROS, JOSÉ LUIS, Shore P. , Bointon P. , Leach R. , Southon N.
External publication Si
Means Proc. Int. Conf. Eur. Soc. Precis. Eng. Nanotechnol., EUSPEN
Scope Conference Paper
Nature Científica
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-84984643606&partnerID=40&md5=89cccdb4dc8ffb4583228620ea57cceb
Publication date 01/01/2016
Scopus Id 2-s2.0-84984643606
Abstract The Cranfield University Precision Engineering Institute team has created a unique plasma figuring capability to correct large optical surfaces at atmospheric pressure. In the context of ever-increasing dimensions of optical components, there is a need for improving the robustness and securing the performance of our Plasma Delivery System (PDS). The current PDS is based on an inductive output L- Type RF circuit, Inductively Coupled Plasma (ICP) torch and computer numerically controlled (CNC) motion system. The combination of optical component surface areas and the nature of the sub- Aperture plasma tool lead to significant processing duration. This atmospheric pressure processing environment is more cost-effective than vacuum chamber based ones which are often used by competitors. However, it requires deep awareness and a fine understanding of technologies used. Based on the knowledge acquired for the past eight years, we have created a smart control system for our unique PDS that equips a machine called Helios1200. This novel control system aims at securing the process determinism and assisting the machine operator by tuning some key electrical components of the RF network and monitoring some processing parameters. Furthermore, specific assistance is provided during the different phases of the plasma processing. This paper describes the main design aspects.
Keywords Atmospheric pressure; Control systems; Cost effectiveness; Electric machine control; Inductively coupled plasma; Machine components; Nanotechnology; Plasma devices; Plasma diagnostics; Precision engin
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