Title Determination of the local environment of silicon and the microstructure of quaternary CrAl(Si)N films
Authors ENDRINO ARMENTEROS, JOSÉ LUIS, Palacín S. , Aguirre M.H. , Gutiérrez A. , Schäfers F.
External publication Si
Means Acta Mater.
Scope Article
Nature Científica
JCR Quartile 1
SJR Quartile 1
JCR Impact 3.62400
SJR Impact 3.27700
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-33847315994&doi=10.1016%2fj.actamat.2006.11.014&partnerID=40&md5=8d1970b2ba28550cb0ed3a4181a9d35e
Publication date 01/01/2007
ISI 000245533900027
Scopus Id 2-s2.0-33847315994
DOI 10.1016/j.actamat.2006.11.014
Abstract Nanocomposite CrAlSiN compounds prepared by the cathodic arc evaporation technique were subjected to structural and mechanical characterization tests. X-ray diffraction, X-ray absorption spectroscopy (XAS) and transmission electron microscopy (TEM) were employed to investigate the effects of Si addition on the structure and phase development of the metastable NaCl structure of high aluminum CrAlN films. TEM studies revealed that partial substitution of the metal component by Si in CrAlN results in the nucleation of a wurtzite h-AlN phase even for amounts of silicon as low as ~2-3 at.%. XAS measurements at the Cr and Si K-edges indicated that the local environment of Cr atoms is strongly affected by the Si addition, and that silicon may also be part of the crystalline phase. These results indicate the formation of complex Cr-Si-X compounds, where X can be N, Al or both, and the formation of composite nanocrystalline CrAlSiN films. © 2006 Acta Materialia Inc.
Keywords Chromium compounds; Nanostructured materials; Nitrides; Nucleation; Physical vapor deposition; Transmission electron microscopy; Metal components; Metastable structures; Nanocrystalline microstructure
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