Title Evolution of structural and physical properties upon annealing of sputter-deposited Zr0.84Y0.16-O2 films incorporating copper and palladium nanoparticles
Authors Zakharov D.I. , Horwat D. , ENDRINO ARMENTEROS, JOSÉ LUIS, Capon F. , Pierson J.F.
External publication Si
Means IOP Conf. Ser. Mater. Sci. Eng.
Scope Conference Paper
Nature Científica
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-84893465022&doi=10.1088%2f1757-899X%2f5%2f1%2f012022&partnerID=40&md5=b4f329295d5b68b8dbad31edb668c0b4
Publication date 01/01/2009
ISI 000285529200022
Scopus Id 2-s2.0-84893465022
DOI 10.1088/1757-899X/5/1/012022
Abstract Me-incorporated Zr0.84Y0.16 oxide thin films (Me: Cu or Pd) were synthesized by magnetron co-sputtering. The film structural evolution due to metal content increase was shown: Me-doped nanocrystalline yttria stabilized zirconia (YSZ); Me-doped amorphous oxide; metal nanoparticles embedded in the amorphous oxide matrix. Annealing for 2 h at 300°C in air promoted copper oxide formation and the segregation of very fine Pd particles. XANES analysis at the Cu-K edge showed that Cu is bonded to oxygen and Zr(Y) in Cu-doped amorphous oxide; this state was not affected by the thermal treatment. XANES and resistivity analyses indicated that the Cu nanoparticles likely have oxidized surfaces while the Pd-containing films showed only minor chemical changes after annealing. © 2009 IOP Publishing Ltd.
Keywords Amorphous oxides; Chemical change; Cu nanoparticles; Magnetron co-sputtering; Metal content; Metal nanoparticles; Nanocrystallines; Oxide thin films; Oxidized surfaces; Palladium nanoparticles; Pd par
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