Title Structural and tribological characterization of Ti-In-N films deposited by magnetron sputter deposition
Authors Nowicki M.A. , Krzanowski J.E. , ENDRINO ARMENTEROS, JOSÉ LUIS
External publication Si
Means J. Mater. Res.
Scope Article
Nature Científica
JCR Quartile 2
SJR Quartile 1
JCR Impact 1.71300
SJR Impact 0.92000
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-84857886361&doi=10.1557%2fjmr.2011.345&partnerID=40&md5=713759139f186b8a37a16ca0838de6d7
Publication date 01/01/2012
ISI 000304064500012
Scopus Id 2-s2.0-84857886361
DOI 10.1557/jmr.2011.345
Abstract TiN-indium composite films were deposited by simultaneous sputtering of titanium and indium in a mixed Argon/Nitrogen atmosphere and characterized for tribological applications. Film compositions showed a nonlinear behavior as a function of sputter gun power. For films deposited at -50 V bias, and containing less than 29 relative percent indium, the films had a face centered cubic structure, but at higher indium contents (63-82%) the structure was not consistent with either TiN or indium. At -150 V bias, the films had either the TiN structure, In-type structure, or a mixture of the two. Atomic force microscopy images showed the formation of semispherical drops on the surface of the samples deposited at -50 V bias voltage, whereas at -150 V bias voltage the samples exhibited a smooth coating surface with occasional ellipsoidal blisters. Nanoindentation test of the films shows low hardness (5-12 GPa), but tribological testing showed that frictional behavior can be improved by moderate heating before testing, suggesting indium segregation to the surface. Copyright © Materials Research Society 2011.
Keywords Atomic force microscopies (AFM); Face centered cubic structure; Film composition; Frictional behavior; Indium content; Indium segregation; Low hardness; Magnetron sputter deposition; Nanoindentation t
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