Título Interface-Induced Plasmon Nonhomogeneity in Nanostructured Metal-Dielectric Planar Metamaterial
Autores Kovalev, A. I. , Wainstein, D. L. , Rashkovskiy, A. Yu. , Gago, R. , Soldera, F. , ENDRINO ARMENTEROS, JOSÉ LUIS, Fox-Rabinovich, G. S.
Publicación externa Si
Alcance Article
Naturaleza Científica
Cuartil JCR 2
Cuartil SJR 2
Impacto JCR 1.75800
Impacto SJR 0.39200
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-84926442678&doi=10.1155%2f2015%2f876247&partnerID=40&md5=c66c030400253d87a97df776c942aeb3
Fecha de publicacion 01/01/2015
ISI 352399000001
Scopus Id 2-s2.0-84926442678
DOI 10.1155/2015/876247
Abstract Transformations of the electronic structure in thin silver layers in metal-dielectric (TiAlN/Ag) multilayer nanocomposite were investigated by a set of electron spectroscopy techniques. Localization of the electronic states in the valence band and reduction of electron concentration in the conduction band was observed. This led to decreasing metallic properties of silver in the thin films. A critical layer thickness of 23.5 nm associated with the development of quantum effects was determined by X-ray photoelectron spectroscopy. Scanning Auger electron microscopy of characteristic energy losses provided images of plasmon localization in the Ag layers. The nonuniformity of plasmon intensities distribution near the metal-nitride interfaces was assessed experimentally.
Palabras clave Auger electron spectroscopy; Electron spectroscopy; Electronic structure; Energy dissipation; Film preparation; Plasmons; Quantum electronics; Quantum theory; Scanning electron microscopy; Silver; Cha
Miembros de la Universidad Loyola

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