| Título | Study of the effects of Si addition on the properties of hard nanocomposite thin films |
|---|---|
| Autores | ENDRINO ARMENTEROS, JOSÉ LUIS, Palacin S. , Gutierrez A. , Aguirre M. , Schäfers F. |
| Publicación externa | Si |
| Medio | Mater Res Soc Symp Proc |
| Alcance | Conference Paper |
| Naturaleza | Científica |
| Impacto SJR | 0.222 |
| Web | https://www.scopus.com/inward/record.uri?eid=2-s2.0-41549099707&doi=10.1557%2fproc-976-0976-ee03-18&partnerID=40&md5=34833ce3dfe8ddb99d8976cd7c51265f |
| Fecha de publicacion | 01/01/2006 |
| Scopus Id | 2-s2.0-41549099707 |
| DOI | 10.1557/proc-976-0976-ee03-18 |
| Abstract | In the present study, hard TiSiN coating compounds with different Si content have been deposited by the magnetron sputtering technique. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) have been employed to investigate the effects of Si addition on the composition, structure and phase development of the cubic NaCl-type structure. To get some insight on these changes, X-ray absorption spectra have been measured at the Ti and Si K-edges in fluorescence yield mode. The collected data showed that the interaction between Ti and Si was weak and the formation of a-Si3N4 can be assumed. Hardness measurements were also consistent with the formation of hard nanocomposite films. A maximum hardness of about 36 GPa was obtained for the sample with 11 at. % Si. © 2007 Materials Research Society. |
| Palabras clave | Hardness testing; Magnetron sputtering; Nanocrystalline silicon; Phase interfaces; X ray absorption spectroscopy; X ray diffraction; Hardness measurements; Nanocomposite thin films; Phase development; Thin films |
| Miembros de la Universidad Loyola |