Title Nanostructure and mechanical properties of WC-SiC thin films
External publication Si
Means J. Mater. Res.
Scope Article
Nature Científica
JCR Quartile 1
SJR Quartile 1
JCR Impact 1.53000
SJR Impact 1.38200
Web https://www.scopus.com/inward/record.uri?eid=2-s2.0-0036968258&doi=10.1557%2fJMR.2002.0457&partnerID=40&md5=dec47d37f952e70df8fc9272de4b97bd
Publication date 01/01/2002
ISI 000179614600026
Scopus Id 2-s2.0-0036968258
DOI 10.1557/JMR.2002.0457
Abstract The mechanical properties of WC-SiC thin films deposited by dual radio frequency magnetron sputtering were investigated. The films were characterized by x-ray photoelectron spectroscopy, x-ray diffraction (XRD), and transmission electron microscopy (TEM) to evaluate the details of the microstructure and degree of amorphization. The results indicate that small additions of SiC (<25%) can significantly increase hardness compared to a pure WC film, but higher SiC contents do not strongly affect hardness. XRD studies show the SiC had a disordering effect. TEM results showed that WC films had coarse porous structure, but films with a low silicon carbide content (approximately 10 to 25 at%) had a denser nanocrystalline structure. Samples with greater than 25% SiC were amorphous. The initial hardness increase at lower SiC contents correlated well with the observed densification, but the transition to an amorphous structure did not strongly affect hardness.
Keywords Amorphization; Crystal microstructure; Densification; Hardness; Magnetron sputtering; Nanostructured materials; Porosity; Silicon carbide; Transmission electron microscopy; Tungsten carbide; X ray dif
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